ISSN: 1003-6326
CN: 43-1239/TG
CODEN: TNMCEW

Vol. 19    Special 3    December 2009

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Si3N4 nano-microsphere synthesized by cathode arc plasma and heat treatment
GENG Zhong-rong(耿中荣)1, YAN Peng-xun(闫鹏勋)2 , FAN Duo-wang (范多旺)1, YUE Guang-hui (岳光辉)2
(1. National Engineering Research Center for Technology and Equipment of Green Coating,
Lanzhou Jiaotong University, Lanzhou 730070, China;
2. Institute for Plasma and Metal Materials, Lanzhou University, Lanzhou 730000, China
)
Abstract: The Si3N4 microcrystals with a hollow sphere structure were prepared by using the simple heat treatment of the Si3N4 flakes, which were prepared by using the cathode arc plasma. The products were characterized by XRD, SEM and TEM. The photoluminescence (PL) spectrum of the Si3N4 nano-microsphere was studied. The obtained Si3N4 microcrystals, which show a hollow sphere structure, are up to several nanometers in diameter. During the process, the heat treatment and Ni catalyst play a key role in the forming structure and morphology. This result provides a possibility for mass producing Si3N4 microcrystals.
Key words: Si3N4 hollow sphere; heat treatment; photoluminescence; cathode arc plasma
Superintended by The China Association for Science and Technology (CAST)
Sponsored by The Nonferrous Metals Society of China (NFSOC)
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