Effects of gradient interlayer on residual stress and
cracking in TiN thin films①
cracking in TiN thin films①
(School of Materials Science and Engineering, ShanghaiJiaotong University,
Shanghai200030, P.R.China)
Shanghai200030, P.R.China)
Abstract: The influence of a gradient interlayer on the residual stress and cracking in TiN thin films was studied as a function of the thickness of gradient interlayer. Both X-ray in-situ tensile testing and grazing method were used to measure the residual stress in thin films. In TiN films, there exists a residual stress of 10GPa, which can be remarkably decreased by a gradient interlayer between film and substrate. The cracking behavior of films after tension shows that the crack of film/substrate system begins at interface between film and substrate.
Key words: TiN thin film; residual stress; gradient interlayer.